GB/T 36706-2018
ActivePolycrystalline indium phosphide
磷化铟多晶
Application Summary AI generated
GB/T 36706-2018 specifies the technical requirements, test methods, inspection rules, and packaging for polycrystalline indium phosphide, a semiconductor material used in high-frequency and optoelectronic devices. It is applied in the manufacturing of substrates for integrated circuits, lasers, and photodetectors within the electronics and telecommunications industries. The standard ensures material purity, crystal quality, and consistency for reliable performance in compound semiconductor production.
Related Standards
GB/T 12964-2003
Monocrystalline silicon polished wafers
GB/T 16596-1996
Specification for establishing a wafer coordinatesystem
GB/T 16595-1996
Specification for a universal wafer grid
GB/T 12965-2005
Monocrystalline silicon as cut slices and lapped slices
GB/T 20230-2006
Indium phosphide single crystal
GB/T 20229-2006
Gallium phosphide single crystal
GB/T 20228-2006
Gallium arsenide single crystal
GB/T 11071-2006
Zone-refined germanium ingot
Transparency note: The application summary and key sentences on this page were automatically generated by AI from the standard's original text. This content has not been human-verified and should not be used for compliance or regulatory purposes. Always refer to the official standard document from the issuing authority.